“Analysis of Plasma Heating Characteristics in Large-Area ICP Etchers for Mass Production”
Prof. Seolhye Park, Committee & Session Chair (Focus Session: Semiconductor & Display Manufacturing Process Technology)
in collaboration with SNU Plasma Application Laboratory (SNUPAL) and Industrial R&D Partners
Department of Nuclear Engineering, Seoul National University (SNU), Seoul
Date: 2026.04.22 (Wed) 14:00-15:00 (KST)
Location: Focus Session Room, Daejeon Convention Center (DCC 1), Daejeon
