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Our Research Area
Where plasma technology meets
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Introduction
Welcome to Seoul National University
Plasma Application Laboratory.
Park, Seolhye
박설혜
Professor
Kwon, Ji-Won
권지원
Ph.D. Candidate
Lee, Myeong-Geon
이명건
Ph.D. Candidate
Park, Taejun
박태준
Ph.D. Candidate
Bae, Namjae
배남재
Ph.D. Candidate
Park, Jihoon
박지훈
Ph.D. Candidate
Lee, Ingyu
이인규
Ph.D. Candidate
Lim, Jaemin
임재민
MS Student
Jin, Seoyoung
진서영
MS Student
Choi, Gyujin
최규진
MS Student
Lee, Yungwon
이윤권
MS Student
Physics-Informed Selection of Non-Maxwellian EEDF Models for Reliable OES-Based Plasma Diagnostics
Ji-Won Kwon, Taejun Park, Jihoon Park, Haneul Lee, Jong-HyeonShin, Dae-Chul Kim, Jong-Bae Park, Jongsik Kim and Gon-Ho Kim
2026
Plasma Sources Science and Technology
Plasma heating characterized PI (plasma information) index for large-area capacitively coupled RF discharges in the mass production system
Seolhye Park, Jaegu Seong, Haneul Lee, Namjae Bae, Ji-Won Kwon, Gon-Ho Kim
2025
Physics of Plasmas
Observation of the floating sheath distribution on Al2O3 and silicon targets adjacent to a DC biased metal substrate
Namjae Bae, Nam-Kyun Kim, Haneul Lee, Yunchang Jang, Seolhye Park, Gon-Ho Kim
2024
Current Applied Physics
Plasma heating characterization of the large area inductively coupled plasma etchers with the plasma information for managing the mass production
Seolhye Park, Yoona Park, Jaegu Seong, Haneul Lee, Namjae Bae, Ki-baek Roh, Rabul Seo, Bongsub Song, Gon-Ho Kim
2024
Physics of Plasmas
Macrocrack propagation with grain growth on transient heat loaded tungsten
Ki-Baek Roh, Myeong-Geon Lee, Kyung-Min Kim, Gon-Ho Kim
2024
Journal of the Korean Physical Society
Sputtering yield increase with fluence in low-energy argon plasma-tungsten interaction
Ki-Baek Roh, Myeong-Geon Lee, Heung Nam Han, Hyoung Chan Kim, Gon-Ho Kim
2024
Fusion Engineering and Design
Application of Plasma Information-Based Virtual Metrology (PI-VM) for Etching in C₄F₈/Ar/O₂ Plasma
Gwanjoong Kim, Ji-Won Kwon, Ingyu Lee, Hwiwon Seo, Jong-Bae Park, Jong-Hyeon Shin, Gon-Ho Kim
2024
IEEE Transactions on Semiconductor Manufacturing
Data-driven plasma science based plasma etching process design in OLED mass production referring to PI-VM
Seolhye Park, Jaegu Seong, Yoona Park, Yeongil Noh, Haneul Lee, Namjae Bae, Ki-Baek Roh, Rabul Seo, Bongsub Song, Gon-Ho Kim
2024
Plasma Physics and Controlled Fusion
Micro-range uniformity control of the etching profile in the OLED display mass production referring to the PI-VM model
Seolhye Park, Jaegu Seong, Yeongil Noh, Yoona Park, Yongsuk Jang, Taeyoung Cho, Jae-Ho Yang, Gon-Ho Kim
2021
Physics of Plasmas
Analysis of electron thermal properties in Ar/O2 inductively coupled plasmas: A global model simulation using Langmuir probe data
Hwiwon Seo, Haneul Lee, Ji-Won Kwon, Gwanjoong Kim, Ingyu Lee, Gon-Ho Kim
2025
Current Applied Physics
2022 Review of Data-Driven Plasma Science
The Field of DDPS
2022
IEEE Transactions on Plasma Science
Investigation of ion collision effect on electrostatic sheath formation in weakly ionized and weakly collisional plasma
Haneul Lee, Nam-Kyun Kim, Myeong-Geon Lee, Ji-Won Kwon, Sung Hyun Son, Namjae Bae, Taejun Park, Seolhye Park, Gon-Ho Kim
2022
Plasma Sources Science and Technology
Plasma Information-based virtual metrology (PI-VM) and mass production process control
Seolhye Park, Jaegu Seong, Yunchang Jang, Hyun-Joon Roh, Ji-Won Kwon, Jinyoung Lee, Sangwon Ryu, Jaemin Song, Ki-Baek Roh, Yeongil Noh, Yoona Park, Yongsuk Jang, Taeyoung Cho, Jae-Ho Yang, Gon-Ho Kim
2022
Journal of the Korean Physical Society
Investigation of ion-induced etch damages on trench surface of Ge2Sb2Te5 in high density Ar/SF6 plasma
Jaemin Song, Myeong-Geon Lee, Sangwon Ryu, Yunchang Jang, Seolhye Park, Gon-Ho Kim
2022
Current Applied Physics
Development of Virtual Metrology Using Plasma Information Variables to Predict Si Etch Profile Processed by SF6/O2/Ar Capacitively Coupled Plasma
Ji-Won Kwon, Sangwon Ryu, Jihoon Park, Haneul Lee, Yunchang Jang, Seolhye Park, Gon-Ho Kim
2021
Materials
Population Kinetics Modeling of Low-Temperature Argon Plasma
Hyun-Kyung Chung, Mi-Young Song, Ji-Won Kwon, Myeong-Geon Lee, Jihoon Park, Namjae Bae, Jeamin Song, Gon-Ho Kim, Dipti, Yuri Ralchenko
2021
Atoms
Phenomenology-based Model Predictive Control of Electron Density in Ar/SF6 Capacitively Coupled Etch Plasma
Sangwon Ryu, Ji-Won Kwon, Ingyu Lee, Jihoon Park, Gon-Ho Kim
2022
Journal of the Korean Physical Society
Development of model predictive control of fluorine density in SF6/O2/Ar etch plasma by oxygen flow rate
Sangwon Ryu, Ji-Won Kwon, Jihoon Park, Ingyu Lee, Seolhye Park, Gon-Ho Kim
2022
Current Applied Physics
Analysis of Si Etch Uniformity of Very High Frequency Driven–Capacitively Coupled Ar/SF6 Plasmas
Seongjae Lim, Ingyu Lee, Haneul Lee, Sung Hyun Son, Gon-Ho Kim
2021
Journal of the Semiconductor & Display Technology
Predictive control of the plasma processes in the OLED display mass production referring to the discontinuity qualifying PI-VM
Seolhye Park, Yongsuk Jang, Taewon Cha, Yeongil Noh, Younghoon Choi, Juyoung Lee, Jaegu Seong, Byungsoo Kim, Taeyoung Cho, Yoona Park, Rabul Seo, Jae-Ho Yang, Gon-Ho Kim
2020
Physics of Plasmas
Characteristics of a plasma information variable in phenomenology-based, statistically-tuned virtual metrology to predict silicon dioxide etching depth
Yunchang Jang, Hyun-Joon Roh, Seolhye Park, Sangmin Jeong, Sanywon Ryu, Ji-Won Kwon, Nam-Kyun Kim, Gon-Ho Kim
2019
Current Applied Physics
Cause analysis of the faults in HARC etching processes by using the PI‐VM model for OLED display manufacturing
Seolhye Park, Yunyoung Kyung, Juyoung Lee, Yongsuk Jang, Taewon Cha, Yeongil Noh, Younghoon Choi, Byungsoo Kim, Taeyoung Cho, Rabul Seo, Jae‐Ho Yang, Yunchang Jang, Sangwon Ryu, Gon‐Ho Kim
2019
Plasma Processes and Polymers
Role of Features in Plasma Information Based Virtual Metrology (PI-VM) for SiO2 Etching Depth
Yunchang Jang, Seolhye Park, Sangmin Jeong, Sangwon Ryu, Gon-Ho Kim
2019
Journal of the Semiconductor & Display Technology
Application of PI-VM for management of the metal target plasma etching processes in OLED display manufacturing
Seolhye Park, Taeyoung Cho, Yongsuk Jang, Yeongil Noh, Younghoon Choi, Taewon Cha, Juyoung Lee, Byungsoo Kim, Jae-Ho Yang, Jeong-Jin Hong, Youngkwan Park, Gon-Ho Kim, Won-Hyouk Jang
2019
Plasma Physics and Controlled Fusion
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2026-03-06
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2026-02-26
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2026-01-05
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2025-09-17
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2025-07-25
