Seolhye Park Professor
Department of Nuclear Engineering
Seoul National University
Research
· Specialization: Fusion and Plasma Physics
· Research Areas: Industrial Applications of Plasma Physics and Plasma Information-based AI
Education
· 2015Ph.D. in Nuclear Engineering, Seoul National University
· 2008B.S. in Nuclear Engineering, Seoul National University
· 2015Ph.D. in Nuclear Engineering, Seoul National University
· 2008B.S. in Nuclear Engineering, Seoul National University
Experiences
· 2026–PresentAssociate Professor, Department of Nuclear Engineering, Seoul National University
· 2024–2025Technical Advisor, National Technology Strategy Center for Materials, KIMS
· 2021–2023Technical Advisor, Intelligent Process Equipment Convergence Research Division, KFE
· 2019–2020Research Planning Advisor, Intelligent Domestic Semiconductor Process Equipment Convergence Research Division, NST
· 2024–2026Principal Engineer, IT Business Division, Samsung Display
· 2022–2024Principal Engineer, Mobile Display Manufacturing Technology Center, Samsung Display
· 2016–2021Staff Engineer, Mobile Display Manufacturing Technology Center, Samsung Display
· 2015–2016Senior Engineer, Samsung Display Research Institute
· 2026–PresentAssociate Professor, Department of Nuclear Engineering, Seoul National University
· 2024–2025Technical Advisor, National Technology Strategy Center for Materials, KIMS
· 2021–2023Technical Advisor, Intelligent Process Equipment Convergence Research Division, KFE
· 2019–2020Research Planning Advisor, Intelligent Domestic Semiconductor Process Equipment Convergence Research Division, NST
· 2024–2026Principal Engineer, IT Business Division, Samsung Display
· 2022–2024Principal Engineer, Mobile Display Manufacturing Technology Center, Samsung Display
· 2016–2021Staff Engineer, Mobile Display Manufacturing Technology Center, Samsung Display
· 2015–2016Senior Engineer, Samsung Display Research Institute
Recent Publications
· 2022 Review of Data-Driven Plasma Science, IEEE Trans. Plasma. Sci. 51 (2023) 1750.
· Data-driven plasma science based plasma etching process design in OLED mass production referring to PI-VM, Plasma Phys. Control. Fusion 66 (2024) 025014.
· Plasma heating characterization of the large area inductively coupled plasma etchers with the plasma information for managing the mass production, Phys. Plasmas 31 (2025) 7.
· Plasma heating characterized PI (Plasma Information) index for large-area capacitively coupled RF discharges in the mass production system, Phys. Plasmas 32 (2025) 8.
· Data-driven plasma science based plasma etching process design in OLED mass production referring to PI-VM, Plasma Phys. Control. Fusion 66 (2024) 025014.
· Plasma heating characterization of the large area inductively coupled plasma etchers with the plasma information for managing the mass production, Phys. Plasmas 31 (2025) 7.
· Plasma heating characterized PI (Plasma Information) index for large-area capacitively coupled RF discharges in the mass production system, Phys. Plasmas 32 (2025) 8.