Publications

Physics-Informed Selection of Non-Maxwellian EEDF Models for Reliable OES-Based Plasma Diagnostics

Ji-Won Kwon, Taejun Park, Jihoon Park, Haneul Lee, Jong-HyeonShin, Dae-Chul Kim, Jong-Bae Park, Jongsik Kim and Gon-Ho Kim

2026

Plasma Sources Science and Technology

Analysis of electron thermal properties in Ar/O2 inductively coupled plasmas: A global model simulation using Langmuir probe data

Hwiwon Seo, Haneul Lee, Ji-Won Kwon, Gwanjoong Kim, Ingyu Lee, Gon-Ho Kim

2025

Current Applied Physics

Plasma heating characterized PI (plasma information) index for large-area capacitively coupled RF discharges in the mass production system

Seolhye Park, Jaegu Seong, Haneul Lee, Namjae Bae, Ji-Won Kwon, Gon-Ho Kim

2025

Physics of Plasmas

Data-driven plasma science based plasma etching process design in OLED mass production referring to PI-VM

Seolhye Park, Jaegu Seong, Yoona Park, Yeongil Noh, Haneul Lee, Namjae Bae, Ki-Baek Roh, Rabul Seo, Bongsub Song, Gon-Ho Kim

2024

Plasma Physics and Controlled Fusion

Application of Plasma Information-Based Virtual Metrology (PI-VM) for Etching in C₄F₈/Ar/O₂ Plasma

Gwanjoong Kim, Ji-Won Kwon, Ingyu Lee, Hwiwon Seo, Jong-Bae Park, Jong-Hyeon Shin, Gon-Ho Kim

2024

IEEE Transactions on Semiconductor Manufacturing

Sputtering yield increase with fluence in low-energy argon plasma-tungsten interaction

Ki-Baek Roh, Myeong-Geon Lee, Heung Nam Han, Hyoung Chan Kim, Gon-Ho Kim

2024

Fusion Engineering and Design

Macrocrack propagation with grain growth on transient heat loaded tungsten

Ki-Baek Roh, Myeong-Geon Lee, Kyung-Min Kim, Gon-Ho Kim

2024

Journal of the Korean Physical Society

Plasma heating characterization of the large area inductively coupled plasma etchers with the plasma information for managing the mass production

Seolhye Park, Yoona Park, Jaegu Seong, Haneul Lee, Namjae Bae, Ki-baek Roh, Rabul Seo, Bongsub Song, Gon-Ho Kim

2024

Physics of Plasmas

Observation of the floating sheath distribution on Al2O3 and silicon targets adjacent to a DC biased metal substrate

Namjae Bae, Nam-Kyun Kim, Haneul Lee, Yunchang Jang, Seolhye Park, Gon-Ho Kim

2024

Current Applied Physics

Development of model predictive control of fluorine density in SF6/O2/Ar etch plasma by oxygen flow rate

Sangwon Ryu, Ji-Won Kwon, Jihoon Park, Ingyu Lee, Seolhye Park, Gon-Ho Kim

2022

Current Applied Physics

Phenomenology-based Model Predictive Control of Electron Density in Ar/SF6 Capacitively Coupled Etch Plasma

Sangwon Ryu, Ji-Won Kwon, Ingyu Lee, Jihoon Park, Gon-Ho Kim

2022

Journal of the Korean Physical Society

Investigation of ion-induced etch damages on trench surface of Ge2Sb2Te5 in high density Ar/SF6 plasma

Jaemin Song, Myeong-Geon Lee, Sangwon Ryu, Yunchang Jang, Seolhye Park, Gon-Ho Kim

2022

Current Applied Physics

Plasma Information-based virtual metrology (PI-VM) and mass production process control

Seolhye Park, Jaegu Seong, Yunchang Jang, Hyun-Joon Roh, Ji-Won Kwon, Jinyoung Lee, Sangwon Ryu, Jaemin Song, Ki-Baek Roh, Yeongil Noh, Yoona Park, Yongsuk Jang, Taeyoung Cho, Jae-Ho Yang, Gon-Ho Kim

2022

Journal of the Korean Physical Society

Investigation of ion collision effect on electrostatic sheath formation in weakly ionized and weakly collisional plasma

Haneul Lee, Nam-Kyun Kim, Myeong-Geon Lee, Ji-Won Kwon, Sung Hyun Son, Namjae Bae, Taejun Park, Seolhye Park, Gon-Ho Kim

2022

Plasma Sources Science and Technology

2022 Review of Data-Driven Plasma Science

The Field of DDPS

2022

IEEE Transactions on Plasma Science

Analysis of Si Etch Uniformity of Very High Frequency Driven–Capacitively Coupled Ar/SF6 Plasmas

Seongjae Lim, Ingyu Lee, Haneul Lee, Sung Hyun Son, Gon-Ho Kim

2021

Journal of the Semiconductor & Display Technology

Population Kinetics Modeling of Low-Temperature Argon Plasma

Hyun-Kyung Chung, Mi-Young Song, Ji-Won Kwon, Myeong-Geon Lee, Jihoon Park, Namjae Bae, Jeamin Song, Gon-Ho Kim, Dipti, Yuri Ralchenko

2021

Atoms

Development of Virtual Metrology Using Plasma Information Variables to Predict Si Etch Profile Processed by SF6/O2/Ar Capacitively Coupled Plasma

Ji-Won Kwon, Sangwon Ryu, Jihoon Park, Haneul Lee, Yunchang Jang, Seolhye Park, Gon-Ho Kim

2021

Materials

Micro-range uniformity control of the etching profile in the OLED display mass production referring to the PI-VM model

Seolhye Park, Jaegu Seong, Yeongil Noh, Yoona Park, Yongsuk Jang, Taeyoung Cho, Jae-Ho Yang, Gon-Ho Kim

2021

Physics of Plasmas

Predictive control of the plasma processes in the OLED display mass production referring to the discontinuity qualifying PI-VM

Seolhye Park, Yongsuk Jang, Taewon Cha, Yeongil Noh, Younghoon Choi, Juyoung Lee, Jaegu Seong, Byungsoo Kim, Taeyoung Cho, Yoona Park, Rabul Seo, Jae-Ho Yang, Gon-Ho Kim

2020

Physics of Plasmas

Application of PI-VM for management of the metal target plasma etching processes in OLED display manufacturing

Seolhye Park, Taeyoung Cho, Yongsuk Jang, Yeongil Noh, Younghoon Choi, Taewon Cha, Juyoung Lee, Byungsoo Kim, Jae-Ho Yang, Jeong-Jin Hong, Youngkwan Park, Gon-Ho Kim, Won-Hyouk Jang

2019

Plasma Physics and Controlled Fusion

Role of Features in Plasma Information Based Virtual Metrology (PI-VM) for SiO2 Etching Depth

Yunchang Jang, Seolhye Park, Sangmin Jeong, Sangwon Ryu, Gon-Ho Kim

2019

Journal of the Semiconductor & Display Technology

Cause analysis of the faults in HARC etching processes by using the PI‐VM model for OLED display manufacturing

Seolhye Park, Yunyoung Kyung, Juyoung Lee, Yongsuk Jang, Taewon Cha, Yeongil Noh, Younghoon Choi, Byungsoo Kim, Taeyoung Cho, Rabul Seo, Jae‐Ho Yang, Yunchang Jang, Sangwon Ryu, Gon‐Ho Kim

2019

Plasma Processes and Polymers

Characteristics of a plasma information variable in phenomenology-based, statistically-tuned virtual metrology to predict silicon dioxide etching depth

Yunchang Jang, Hyun-Joon Roh, Seolhye Park, Sangmin Jeong, Sanywon Ryu, Ji-Won Kwon, Nam-Kyun Kim, Gon-Ho Kim

2019

Current Applied Physics