Plasma
Information
-based
Artificial
Intelligence
(PI-AI)
conducts research on “Data-driven Plasma Science” across diverse fields,
including plasma processing for semiconductor & display manufacturing, plasma diagnostics and monitoring for fusion plasmas, and applied plasma physics.
We extract plasma physics information from various types of data generated in world-leading semiconductor and display manufacturing sites,
and integrate it with AI to develop Plasma Information-based Virtual Metrology (PI-VM), Plasma Information-based Advanced Process Control (PI-APC), and a broad range of Plasma Information-based Artificial Intelligence (PI-AI) technologies.
Based on these technologies, SNUPAL is leading research on PI-AI for semiconductor and display processes, including process-result prediction, causal-factor identification, process design, and mass-production control.
Plasma
Processes
for Semiconductor
& Display
Manufacturing
develops various emerging and next-generation plasma processes for semiconductor and display manufacturing.
By combining flexible PI-AI-based methodologies with a deep understanding of low-temperature plasma physics, kinetics modeling techniques, various plasma diagnostics, and modeling of plasma–surface interactions,
we conduct research on process optimization for new pattern architectures in conventional plasma processes such as etching, PECVD, and sputtering,
as well as on new-material process development, cryogenic processes, and next-generation plasma processes for advanced chips, including ALE and ALD.
Plasma
Physics &
Application
conducts in-depth research on the Plasma Physics underlying semiconductor and display plasma manufacturing processes.
We investigate complex process plasmas based on kinetic modeling, which is essential for understanding plasma phenomena,
and conduct in-depth research on plasma sheaths, which remain a challenging topic in the Low-Temperature Plasma Physics Society.
Through fundamental studies on sheath dynamics in plasmas containing negative ions, electron heating theory, and plasma optical and electrical diagnostics,
SNUPAL aims to lead the field and expand the application of plasma technologies across diverse areas.
Plasma
-facing
Materials
and Surface
Reaction
conducts research on plasma-facing materials and surface reactions, which are essential for understanding semiconductor and display plasma processes
and are among the core technologies for fusion energy commercialization.
We investigate the evolution of surfaces that continuously interact with plasma volume and sheath regions, providing deeper insight into plasma–surface interaction phenomena.
This research serves as a fundamental technology platform for a wide range of plasma application engineering fields.