Invited Researchers and Presentations
Satoshi Hamaguchi
“Welcome and Introduction to the Hamaguchi Group’s Research Activities”
Nicolas Mauchamp
“Machine-Learning Potential Functions for Molecular Dynamics Simulations of Plasma–Surface Interactions”
Seolhye Park
“Introduction to the Park Group’s Research Activities”
Ingyu Lee
“Development of a Face-Local Surface-State Two-Dimensional Monte Carlo Feature Profile Model for Ar/C₄F₈/O₂ Plasma Etch Profile Simulation”
Pierre Vinchon
“Plasma–Surface Interaction Experiments”
Jarl Collado
“Kinetic Monte Carlo Simulation of Al₂O₃”
Taejun Park
“Plasma Information–Based Characterization of Wedge-Shaped Bowed Etching Profiles Driven by Ion Dynamics under Tailored Voltage-Waveform Biasing”
Seoyoung Jin
“Progress in Establishing Structural Design Rules for Ion Acoustic Wave Detection”
Myeong-Geon Lee
“Investigation of Collision Effects on Ion Dynamics in the Presheath and Sheath of Weakly Collisional Magnetized Hydrogen Plasmas”
Gyujin Choi
“Formation Mechanism of Non-Maxwellian Electron Energy Distribution Functions in Multidipole Hot-Filament Discharges”
Lucas Spiske
“Surface Reactions in Metal-Oxide Atomic Layer Etching”
Namjae Bae
“Generalized Bohm Criterion in Multispecies Electronegative Plasmas”
Ji-Won Kwon
“Self-Improving Dynamic Advanced Process Control Using EEDF-Based Plasma Information for Nanoscale Precision Etching”
Simon Chouteau
“Plasma Diagnostics Using Optical Emission Spectroscopy”
Jihoon Park
“Plasma-Physics-Informed Explainable AI Analysis of Feature-Scale Etch-Profile Variations in Fluorocarbon-Based High-Aspect-Ratio Plasma Etching”
Yun Gwon Lee
“Study of the Sheath Structure of a DC-Biased Target in a Multidipole Filament Source Using Laser-Induced Fluorescence and Emissive-Probe Diagnostics”
Kazumasa Ikuse
“Data-Driven Prediction of Etch Rates”
Workshop Activities
- Laboratory tour
- Research discussions
- Lunch meetings
- Free time for visiting researchers
- Collaborative exchange between the Satoshi Hamaguchi Group and the Seolhye Park Group
Date: July 7–9, 2026
Location: The University of Osaka, Osaka, Japan