“Designing and Setting up the New OLED Display Mass-Producing Fab Referring to Plasma Information-Based Virtual Metrology (PI-VM)”
Prof. Seolhye Park, Invited Speaker
at the 7th International Conference on Data-Driven Plasma Science (ICDDPS-7)
Date: 2026.08.07 (Fri)
“Adaptive Etch Depth Control Using Plasma Information-Based Virtual Metrology with Model-Selective Non-Maxwellian EEDF”
Ji-Won Kwon, Oral Presenter
at the 7th International Conference on Data-Driven Plasma Science (ICDDPS-7)
in collaboration with Jihoon Park, Taejun Park, and Seolhye Park
Date: 2026.08.03 (Mon)
“Development of PI-VM Model for Bowing Structure of Si Trench Etch Profile in SF₆/O₂/Ar TVW-Driven DF-CCP”
Taejun Park, Oral Presenter
at the 7th International Conference on Data-Driven Plasma Science (ICDDPS-7)
in collaboration with Jihoon Park, Ji-Won Kwon, Ingyu Lee, Gon-Ho Kim, and Seolhye Park
Date: 2026.08.06 (Thu)
“Metrology-Driven Material Probe: A Physics-Informed AI Framework for Feature-Resolved Interpreting Plasma–Surface Kinetics in High-Aspect-Ratio Etching”
Jihoon Park, Oral Presenter
at the 7th International Conference on Data-Driven Plasma Science (ICDDPS-7)
in collaboration with Ji-Won Kwon, Taejun Park, Gon-Ho Kim, and Seolhye Park
Date: 2026.08.06 (Thu)
Location: Kiel University, Kiel, Germany